Form：KLA-Tencor 2017/9/18Browse：5410

KLA-Tencor today introduced five development control systems for logic and cutting-edge memory design nodes below 7 nm to help wafer manufacturers achieve the rigorous process tolerances required for multiple exposure techniques and EUV lithography. At the IC manufacturing facility, the ATL stacking measurement system and the SpectraFilmF1 thin film measurement system provide process characterization analysis and offset monitoring for the fabrication of finFET, DRAM, 3D NAND and other complex component structures.

Form：KLA-Tencor 2017/8/22Browse：4668

KLA-Tencor announces the launch of the new FlashScan ™ blank mask * detection product line. Since the launch of the first inspection system in 1978, KLA-Tencor has been a major supplier of pattern mask inspection, and the new FlashScan product line has announced that the company has entered a dedicated blank mask inspection market.